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Physics > Chemical Physics

arXiv:1605.09725 (physics)
[Submitted on 2 May 2016]

Title:Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by atmospheric He-O$_2$ post-discharge

Authors:Thierry Dufour, Julie Hubert, Nicolas Vandencasteele, Pascal Viville, Roberto Lazzaroni, François Reniers
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Abstract:Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been treated by the post-discharge of an atmospheric RF-plasma torch supplied with helium and oxygen gases. The plasma-treated surfaces were characterized by measurements of mass losses, water contact angles, x-ray photoelectron spectroscopy and atomic force microscopy. This experimental approach correlated with an optical characterization of the plasma phase allowed us to propose etching mechanisms occurring at the post-discharge/polymer interface. We discuss how competitive and synergistic effects can result from the oxidation and/or the roughening of the surface but also from the excimer VUV radiation, the He metastable species and the O radicals reaching the plasma-polymer interface.
Subjects: Chemical Physics (physics.chem-ph)
Cite as: arXiv:1605.09725 [physics.chem-ph]
  (or arXiv:1605.09725v1 [physics.chem-ph] for this version)
  https://doi.org/10.48550/arXiv.1605.09725
Journal reference: J. Phys. D: Appl. Phys., 2013, Vol. 46, Issue 31, 315203 (14 pp)
Related DOI: https://doi.org/10.1088/0022-3727/46/31/315203

Submission history

From: Thierry Dufour [view email]
[v1] Mon, 2 May 2016 23:16:34 UTC (2,123 KB)
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